• DocumentCode
    1103387
  • Title

    VA-7 self-aligned substitutional emitter process for GaAs/(GaAl)As heterojunction bipolar transistors

  • Author

    Chang, M.F. ; Asbeck, P.M. ; Miller, Douglas L. ; Wang, K.C.

  • Volume
    32
  • Issue
    11
  • fYear
    1985
  • fDate
    11/1/1985 12:00:00 AM
  • Firstpage
    2547
  • Lastpage
    2547
  • Keywords
    Bipolar transistors; Contact resistance; Etching; Gallium arsenide; Geometry; Heterojunction bipolar transistors; Implants; Lithography; Materials science and technology; Resists;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22359
  • Filename
    1485105