DocumentCode :
1103411
Title :
Analysis of the temperature dependence of hot-carrier-induced degradation in bipolar transistors for Bi-CMOS
Author :
Momose, Hisayo Sasaki ; Iwai, Hiroshi
Author_Institution :
ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
Volume :
41
Issue :
6
fYear :
1994
fDate :
6/1/1994 12:00:00 AM
Firstpage :
978
Lastpage :
987
Abstract :
The temperature dependence of emitter-base reverse stress degradation in bipolar transistors for Bi-CMOS circuits was studied. A suitable measure of degradation in the operating temperature range was chosen after careful consideration of the fact that bipolar transistor characteristics are very sensitive to temperature changes. The worst-case temperature conditions within the transistors´ operating range were determined. Degradation was found to be worst at around 50°C-a result of a tradeoff between thermal recovery from degradation and the effects of bandgap narrowing on bipolar characteristics. The recovery phenomena which had taken place after degradation were also investigated in detail
Keywords :
BiCMOS integrated circuits; bipolar transistors; hot carriers; 50 C; BiCMOS circuits; bandgap narrowing; bipolar transistors; emitter-base reverse stress degradation; hot-carrier-induced degradation; temperature dependence; thermal recovery; worst-case temperature conditions; Bipolar transistors; Circuits; Delay; Hot carrier injection; Hot carriers; Stress; Temperature dependence; Temperature distribution; Temperature sensors; Thermal degradation;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.293311
Filename :
293311
Link To Document :
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