DocumentCode
1103542
Title
Electron transport properties of Ga0.51In0.49P for device applications
Author
Besikci, Cengiz ; Razeghi, M.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Northwestern Univ., Evanston, IL, USA
Volume
41
Issue
6
fYear
1994
fDate
6/1/1994 12:00:00 AM
Firstpage
1066
Lastpage
1069
Abstract
We present Monte Carlo calculations of steady-state and transient electron transport properties of Ga0.51In0.49P. We have made a simulation-based comparison between Ga0.51In0.49P and AlxGa1-xAs(x=0.2, 0.3). Our Monte Carlo data show that transport properties of G0.51In0.49P are favorable, and when the other advantages of the GaInP/GaAs system are also taken into account, this material is a good choice to replace Al xGa1-xAs(x⩾0.3). We have also calculated electron drift and Hall mobilities in Ga0.51In0.49P as a function of impurity concentration and temperature, and determined the effects of different scattering mechanisms on the low-field mobility. Calculated results are in good agreement with the measurements on metal organic chemical vapor deposition (MOCVD) grown samples with Hall mobilities within a factor of 0.5 of the calculated theoretical limit. It has also been found that alloy scattering is an important mobility degrading mechanism in lightly doped material at low temperatures
Keywords
Hall effect; III-V semiconductors; Monte Carlo methods; carrier mobility; field effect transistors; gallium compounds; heterojunction bipolar transistors; hot carriers; impurity scattering; indium compounds; GaInP; HBTs; HFETs; Hall mobilities; MOCVD grown samples; Monte Carlo calculations; alloy scattering; device applications; electron drift; heterojunction devices; impurity concentration; lightly doped material; low-field mobility; mobility degrading mechanism; scattering mechanisms; steady-state electron transport; transient electron transport; Chemical vapor deposition; Electron mobility; Gallium arsenide; Hall effect; Impurities; Light scattering; Monte Carlo methods; Organic chemicals; Steady-state; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.293323
Filename
293323
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