DocumentCode :
1103957
Title :
Fabrication of high-efficiency n+-p junction InP solar cells by using group VIb element diffusion into p-type InP
Author :
Yamamoto, Akio ; Yamaguchi, Masafumi ; Uemura, Chikao
Author_Institution :
Nippon Telegraph and Telephone Corporation, Ibaraki, Japan
Volume :
32
Issue :
12
fYear :
1985
fDate :
12/1/1985 12:00:00 AM
Firstpage :
2780
Lastpage :
2786
Abstract :
The fabrication of n+-p homojunction InP solar cells has been studied using thermal diffusion of S, Se, or Te into p-type InP substrates. Sulphur diffusion using an In2S3source was found to be effective in forming a shallow and steep n+-p function without surface morphology degradation of substrates. A conversion efficiency (active area) of 18 percent, which is the highest efficiency ever reported for InP homojunction solar cells, was obtained by optimizing fabrication conditions for sulphur-diffused cells. An electron irradiation study on fabricated cells has also been made. The InP solar cell was found to have a higher resistance to radiation degradation than Si and GaAs cells. Through these studies, it has been demonstrated that the InP solar cell has excellent potential for space applications.
Keywords :
Fabrication; Gallium arsenide; Heterojunctions; Indium phosphide; Indium tin oxide; Lighting; Photovoltaic cells; Surface morphology; Tellurium; Thermal degradation;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22416
Filename :
1485162
Link To Document :
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