DocumentCode
1103957
Title
Fabrication of high-efficiency n+-p junction InP solar cells by using group VIb element diffusion into p-type InP
Author
Yamamoto, Akio ; Yamaguchi, Masafumi ; Uemura, Chikao
Author_Institution
Nippon Telegraph and Telephone Corporation, Ibaraki, Japan
Volume
32
Issue
12
fYear
1985
fDate
12/1/1985 12:00:00 AM
Firstpage
2780
Lastpage
2786
Abstract
The fabrication of n+-p homojunction InP solar cells has been studied using thermal diffusion of S, Se, or Te into p-type InP substrates. Sulphur diffusion using an In2 S3 source was found to be effective in forming a shallow and steep n+-p function without surface morphology degradation of substrates. A conversion efficiency (active area) of 18 percent, which is the highest efficiency ever reported for InP homojunction solar cells, was obtained by optimizing fabrication conditions for sulphur-diffused cells. An electron irradiation study on fabricated cells has also been made. The InP solar cell was found to have a higher resistance to radiation degradation than Si and GaAs cells. Through these studies, it has been demonstrated that the InP solar cell has excellent potential for space applications.
Keywords
Fabrication; Gallium arsenide; Heterojunctions; Indium phosphide; Indium tin oxide; Lighting; Photovoltaic cells; Surface morphology; Tellurium; Thermal degradation;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1985.22416
Filename
1485162
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