• DocumentCode
    1103957
  • Title

    Fabrication of high-efficiency n+-p junction InP solar cells by using group VIb element diffusion into p-type InP

  • Author

    Yamamoto, Akio ; Yamaguchi, Masafumi ; Uemura, Chikao

  • Author_Institution
    Nippon Telegraph and Telephone Corporation, Ibaraki, Japan
  • Volume
    32
  • Issue
    12
  • fYear
    1985
  • fDate
    12/1/1985 12:00:00 AM
  • Firstpage
    2780
  • Lastpage
    2786
  • Abstract
    The fabrication of n+-p homojunction InP solar cells has been studied using thermal diffusion of S, Se, or Te into p-type InP substrates. Sulphur diffusion using an In2S3source was found to be effective in forming a shallow and steep n+-p function without surface morphology degradation of substrates. A conversion efficiency (active area) of 18 percent, which is the highest efficiency ever reported for InP homojunction solar cells, was obtained by optimizing fabrication conditions for sulphur-diffused cells. An electron irradiation study on fabricated cells has also been made. The InP solar cell was found to have a higher resistance to radiation degradation than Si and GaAs cells. Through these studies, it has been demonstrated that the InP solar cell has excellent potential for space applications.
  • Keywords
    Fabrication; Gallium arsenide; Heterojunctions; Indium phosphide; Indium tin oxide; Lighting; Photovoltaic cells; Surface morphology; Tellurium; Thermal degradation;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.22416
  • Filename
    1485162