DocumentCode :
1103963
Title :
Leakage Minimization Technique for Nanoscale CMOS VLSI
Author :
Kim, Kyung Ki ; Kim, Yong-Bin ; Choi, Minsu ; Park, Nohpill
Author_Institution :
Northeastern Univ, Boston
Volume :
24
Issue :
4
fYear :
2007
Firstpage :
322
Lastpage :
330
Abstract :
Because of the continued scaling of technology and supply-threshold voltage, leakage power has become more significant in power dissipation of nanoscale CMOS circuits. Therefore, estimating the total leakage power is critical to designing low-power digital circuits. In nanometer CMOS circuits, the main leakage components are the subthreshold, gate-tunneling, and reverse-biased junction band-to-band-tunneling (BTBT) leakage currents.
Keywords :
CMOS digital integrated circuits; VLSI; integrated circuit design; leakage currents; low-power electronics; nanoelectronics; gate-tunneling; leakage power minimization technique; low-power digital circuit design; nanoscale CMOS VLSI circuit; power dissipation; reverse-biased junction band-to-band-tunneling leakage current; supply-threshold voltage scaling; Breakdown voltage; CMOS technology; Circuit testing; Leakage current; NP-hard problem; Power dissipation; Semiconductor device modeling; Subthreshold current; Tunneling; Very large scale integration; cell characterization; gate-tunneling current; input pattern generation; leakage power; nanometer CMOS; subthreshold leakage current;
fLanguage :
English
Journal_Title :
Design & Test of Computers, IEEE
Publisher :
ieee
ISSN :
0740-7475
Type :
jour
DOI :
10.1109/MDT.2007.111
Filename :
4293176
Link To Document :
بازگشت