Title :
A four-vacuum-cycle lift-off process for the polycrystalline CdSe thin-film transistor
Author :
Vanfleteren, J. ; Van Calster, A.
Author_Institution :
Ghent State University, Belgium
fDate :
1/1/1985 12:00:00 AM
Abstract :
A photolithographic process is described for the fabrication of the polycrystalline CdSe thin-film transistor (TFT). This process only uses four vacuum cycles and four lift-off masks, without the need of sputter cleaning to prevent contamination. The devices made have a stability similar to the ones made by the single-vacuum process.
Keywords :
Annealing; Cleaning; Contamination; Fabrication; Isolators; Resists; Sandwich structures; Semiconductor films; Substrates; Thin film transistors;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1985.26025
