DocumentCode :
1104281
Title :
Fabrication of NMOS capacitors with a low-voltage coefficient at a silicon foundry
Author :
Helms, W.J.
Volume :
6
Issue :
1
fYear :
1985
fDate :
1/1/1985 12:00:00 AM
Firstpage :
54
Lastpage :
56
Abstract :
The custom integrated circuit design technique pioneered by Mead and Conway [1] is often used for moderately complex digital systems. The fabrication is carried out at a "foundry" where a "standard" NMOS process is applied to the design. In this note, the Mead-Conway technique has been applied to analog circuits with the goal of producing a reasonable quality switched capacitor filter with as few process modifications as possible. Seven chip runs have been carried out at two separate foundries with good and consistent results.
Keywords :
Analog circuits; Application specific integrated circuits; Digital systems; Fabrication; Filters; Foundries; MOS devices; Silicon; Switched capacitor circuits; Switching circuits;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26039
Filename :
1485192
Link To Document :
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