DocumentCode :
1104452
Title :
InGaN/GaN multi-quantum-well planar metal-semiconductor-metal light-emitting diodes
Author :
Miao, C. ; Lu, H. ; Du, X.Z. ; Li, Y. ; Zhang, R. ; Zheng, Y.D.
Author_Institution :
Nanjing Univ., Nanjing
Volume :
44
Issue :
6
fYear :
2008
Firstpage :
441
Lastpage :
442
Abstract :
Planar metal-semiconductor-metal light-emitting diodes with InGaN/GaN multi-quantum-wells (MQWs) as the active layer have been demonstrated for the first time. The diodes with interdigitated Schottky electrodes fabricated on p-GaN contact layer exhibit symmetrical current-voltage characteristic with a turn-on voltage of ~ 13 V at 20 mA. The violet light emission centred at 408 nm is generated by radiative recombination taking place in the MQWs. The evolution of light output power against injection current reveals an enhanced carrier collecting efficiency of the active MQWs at higher injection current level, which follows a P prop I2.8 trend below 30 mA.
Keywords :
gallium compounds; indium compounds; light emitting diodes; metal-semiconductor-metal structures; quantum well devices; InGaN-GaN; Schottky electrodes; current 20 mA; injection current level; light-emitting diodes; multi-quantum-wells; planar metal-semiconductor-metal structures; radiative recombination; wavelength 408 nm;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20083579
Filename :
4472430
Link To Document :
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