Title :
Geometry effects in MOSFET channel length extraction algorithms
Author :
Wordeman, M.R. ; Sun, J.Y.-C. ; Laux, S.E.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY, USA
fDate :
4/1/1985 12:00:00 AM
Abstract :
Several techniques have been proposed to determine the channel length and series resistance of MOSFET´s. Numerical simulations show that these algorithms must carefully account for two-dimensional geometry effects in order to extract parameters which are physically meaningful. New techniques which take these effects into account are proposed for extracting the channel length and series resistance.
Keywords :
Distortion measurement; Doping; Electric resistance; Electrical resistance measurement; FETs; Geometry; Length measurement; MOSFET circuits; Numerical simulation; Voltage;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1985.26091