• DocumentCode
    1105202
  • Title

    Three-terminal superconducting device using a Si single-crystal film

  • Author

    Nishino, T. ; Miyake, M. ; Harada, Y. ; Kawabe, U.

  • Author_Institution
    Central Research Laboratory, Hitachi, Ltd., Tokyo, Japan
  • Volume
    6
  • Issue
    6
  • fYear
    1985
  • fDate
    6/1/1985 12:00:00 AM
  • Firstpage
    297
  • Lastpage
    299
  • Abstract
    A three-terminal superconducting device composed of a semiconductor-coupled Josephson junction and an oxide-insulated gate is fabricated. A p-type Si single-crystal film having a 100-nm thickness is used for the semiconductor layer. Two superconducting electrodes of the Josephson junction correspond to source and drain electrodes of the three-terminal device. Josephson tunneling current flows between source and drain electrodes, and is controlled by the gate bias voltage.
  • Keywords
    Boron; Electrodes; Impurities; Josephson junctions; Semiconductor films; Semiconductor thin films; Superconducting devices; Superconducting epitaxial layers; Superconducting films; Superconducting integrated circuits;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26131
  • Filename
    1485284