DocumentCode :
1105202
Title :
Three-terminal superconducting device using a Si single-crystal film
Author :
Nishino, T. ; Miyake, M. ; Harada, Y. ; Kawabe, U.
Author_Institution :
Central Research Laboratory, Hitachi, Ltd., Tokyo, Japan
Volume :
6
Issue :
6
fYear :
1985
fDate :
6/1/1985 12:00:00 AM
Firstpage :
297
Lastpage :
299
Abstract :
A three-terminal superconducting device composed of a semiconductor-coupled Josephson junction and an oxide-insulated gate is fabricated. A p-type Si single-crystal film having a 100-nm thickness is used for the semiconductor layer. Two superconducting electrodes of the Josephson junction correspond to source and drain electrodes of the three-terminal device. Josephson tunneling current flows between source and drain electrodes, and is controlled by the gate bias voltage.
Keywords :
Boron; Electrodes; Impurities; Josephson junctions; Semiconductor films; Semiconductor thin films; Superconducting devices; Superconducting epitaxial layers; Superconducting films; Superconducting integrated circuits;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26131
Filename :
1485284
Link To Document :
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