DocumentCode :
1105233
Title :
Multiple-channel GaAs/AlGaAs high electron mobility transistors
Author :
Sheng, N.H. ; Lee, C.P. ; Chen, R.T. ; Miller, D.L. ; Lee, S.J.
Author_Institution :
Rockwell International Corporation, Thousand Oaks, CA
Volume :
6
Issue :
6
fYear :
1985
fDate :
6/1/1985 12:00:00 AM
Firstpage :
307
Lastpage :
310
Abstract :
Multiple-channel high electron mobility transistors (HEMT´s) have been designed and fabricated on GaAs/AlGaAs heterostructural material grown by molecular beam epitaxy (MBE). The sheet carrier density of the two-dimensional electron gas (2-DEG) measured at 77 K was linearly proportional to the number of high mobility electron channels, and reached 5.3 × 1012cm-2for six-channel HEMT structures. Depletion-mode devices of the double-heterojunction HEMT were operated between negative pinchoff voltage and forward-biased gate voltage without any transconductance degradation. A peak extrinsic transconductance of 360 mS/mm at 300 K and 550 mS/mm at 77 K has been measured for a 1-µm gate-length double-heterojunction enhancement-mode device. An extremely high drain current of 800 mA/mm with a gate-to-drain avalanche breakdown voltage of 9 V was measured on six-channel devices.
Keywords :
Charge carrier density; Density measurement; Electron mobility; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Sheet materials; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26134
Filename :
1485287
Link To Document :
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