DocumentCode :
1105447
Title :
Effect of selective tungsten as a polysilicon shunt on CMOS ring-oscillator performance
Author :
Metz, W.A. ; Szluk, N.J. ; Miller, G.W. ; Hayworth, H.O.
Author_Institution :
NCR Corporation, Fort Collins, CO
Volume :
6
Issue :
7
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
372
Lastpage :
374
Abstract :
Selective tungsten is applied as a polysilicon shunt to CMOS ring oscillators specifically designed to be interconnect limited. The tungsten shunted ring oscillators operate at a frequency almost twice that of nonshunted oscillators. Shunting of source/drains as well as gates leads to further performance enhancements. Similar improvements are demonstrated for VLSI circuits.
Keywords :
CMOS technology; Circuit optimization; Fabrication; Frequency; Histograms; Integrated circuit interconnections; Production; Ring oscillators; Silicon; Tungsten;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26158
Filename :
1485311
Link To Document :
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