• DocumentCode
    1105454
  • Title

    Comments on "Isotope effects in MNOS transistors"

  • Author

    Topich, J.A.

  • Author_Institution
    NCR Corporation, Miamisburg, OH
  • Volume
    6
  • Issue
    7
  • fYear
    1985
  • fDate
    7/1/1985 12:00:00 AM
  • Firstpage
    375
  • Lastpage
    376
  • Abstract
    In reading the above mentioned letter, the author presents material which is suppose to verify that silicon to hydrogen or silicon to deuterium bonds are responsible for charge trapping in MNOS nonviolate memory devices. In his discussions of the experimental results, he has failed to address other work in the literature which attribute different properties to the silicon hydrogen bond in silicon nitride. These comments will discuss other works in the literature dealing with hydrogen in silicon nitride and its influence on the charge-trapping mechanism.
  • Keywords
    Annealing; Deuterium; Hydrogen; Isotopes; Nitrogen; Nonvolatile memory; Reflection; Silicon; Temperature; Thermal degradation;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1985.26159
  • Filename
    1485312