DocumentCode :
1105454
Title :
Comments on "Isotope effects in MNOS transistors"
Author :
Topich, J.A.
Author_Institution :
NCR Corporation, Miamisburg, OH
Volume :
6
Issue :
7
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
375
Lastpage :
376
Abstract :
In reading the above mentioned letter, the author presents material which is suppose to verify that silicon to hydrogen or silicon to deuterium bonds are responsible for charge trapping in MNOS nonviolate memory devices. In his discussions of the experimental results, he has failed to address other work in the literature which attribute different properties to the silicon hydrogen bond in silicon nitride. These comments will discuss other works in the literature dealing with hydrogen in silicon nitride and its influence on the charge-trapping mechanism.
Keywords :
Annealing; Deuterium; Hydrogen; Isotopes; Nitrogen; Nonvolatile memory; Reflection; Silicon; Temperature; Thermal degradation;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26159
Filename :
1485312
Link To Document :
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