DocumentCode
1105454
Title
Comments on "Isotope effects in MNOS transistors"
Author
Topich, J.A.
Author_Institution
NCR Corporation, Miamisburg, OH
Volume
6
Issue
7
fYear
1985
fDate
7/1/1985 12:00:00 AM
Firstpage
375
Lastpage
376
Abstract
In reading the above mentioned letter, the author presents material which is suppose to verify that silicon to hydrogen or silicon to deuterium bonds are responsible for charge trapping in MNOS nonviolate memory devices. In his discussions of the experimental results, he has failed to address other work in the literature which attribute different properties to the silicon hydrogen bond in silicon nitride. These comments will discuss other works in the literature dealing with hydrogen in silicon nitride and its influence on the charge-trapping mechanism.
Keywords
Annealing; Deuterium; Hydrogen; Isotopes; Nitrogen; Nonvolatile memory; Reflection; Silicon; Temperature; Thermal degradation;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1985.26159
Filename
1485312
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