DocumentCode :
1105642
Title :
Cell geometry effect on IGT latch-up
Author :
Yilmaz, H.
Author_Institution :
General Electric Company, Syracuse, NY
Volume :
6
Issue :
8
fYear :
1985
fDate :
8/1/1985 12:00:00 AM
Firstpage :
419
Lastpage :
421
Abstract :
The effect of the emitter cell geometry on insulated gate transistor (IGT) performance has been investigated. The three-dimensional well resistances (emitter shunting resistance) of the square, circular, stripe, and multiple surface short (MSS) have been calculated. The MSS cell geometry has the lowest emitter shunting resistance. As a result, MSS cell has the highest latch-up current capability. It has been experimentally proven that the stripe cell has extremely high latch-up current, and the MSS cell design is current limited. The IGT´s with circular and square cell have the lowest latch-up current capability.
Keywords :
Buffer layers; Geometry; Helium; Insulation; P-n junctions; Strips; Surface resistance; Switches; Temperature; Thyristors;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26176
Filename :
1485329
Link To Document :
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