DocumentCode :
1105863
Title :
Very short gate-length GaAs MESFET´s
Author :
Patrick, W. ; Mackie, W.S. ; Beaumont, S.P. ; Wilkinson, C.D.W. ; Oxley, C.H.
Author_Institution :
Glasgow University, Glasgow, Scotland, U.K.
Volume :
6
Issue :
9
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
471
Lastpage :
472
Abstract :
GaAs MESFET´s with gate lengths ranging from 0.36 µm down to 0.055 µm, the smallest so far reported, have been fabricated using electron-beam lithography. DC output characteristics were obtained from all of the devices tested and transconductances up to 300 mS/mm were measured. However it was observed that there is a maximum drain-source voltage that can be pinched off in these short gate devices. This voltage varies exponentially from 1 V in the 0.055-µm gate devices to 6 V in the 0.36-µm device. It is speculated that this effect is due to current injection into the buffer layer.
Keywords :
Annealing; Buffer layers; Etching; Fabrication; Gallium arsenide; Lithography; MESFETs; Ohmic contacts; Resists; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26196
Filename :
1485349
Link To Document :
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