DocumentCode
1106014
Title
Temperature dependence of the Hooge parameter in n-channel Silicon JFET´s
Author
Pawlikiewicz, A. ; van der Ziel, A.
Author_Institution
University of Minnesota, Minneapolis, MN
Volume
6
Issue
10
fYear
1985
fDate
10/1/1985 12:00:00 AM
Firstpage
500
Lastpage
501
Abstract
The Hooge noise parameter αH of n-channel Si-JFET\´s was measured as a function of temperature between 250 and 400 K. The data are in full agreement with an earlier heuristic quantum
noise expression introduced by van der Ziel et al. and based on Handel\´s quantum
noise theory.
noise expression introduced by van der Ziel et al. and based on Handel\´s quantum
noise theory.Keywords
Effective mass; Equations; Lattices; Noise generators; Noise measurement; Phonons; Silicon; Temperature dependence; Temperature distribution; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1985.26208
Filename
1485361
Link To Document