DocumentCode :
1106029
Title :
Polycrystalline-silicon integrated photoconductors for picosecond pulsing and gating
Author :
Bowman, D.R. ; Hammond, R.B. ; Dutton, R.W.
Author_Institution :
U.S. Military Academy, West Point, NY
Volume :
6
Issue :
10
fYear :
1985
fDate :
10/1/1985 12:00:00 AM
Firstpage :
502
Lastpage :
504
Abstract :
We describe an integrated high-speed photoconductor constructed from polycrystalline silicon using standard-integrated-circuit-fabrication techniques followed by photoresist-masked ion-beam irradiation. Optoelectronic correlation measurements have demonstrated the use of these photoconductive circuit elements (PCE´s) as sampling gates with 3-dB measurement bandwidths of ∼100 GHz. Because of the virtual absence of noise and jitter, high-resolution sampling of small high-speed signals is possible. Also, undamaged polycrystalline-silicon-PCE pulsers have produced step pulses with amplitudes up to 1 V, risetimes of <6 ps, and pulse lengths of ∼50 ps.
Keywords :
Annealing; Circuit testing; Distributed parameter circuits; Fabrication; Integrated circuit measurements; Laboratories; Performance evaluation; Photoconducting devices; Photoconductivity; Sampling methods;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26209
Filename :
1485362
Link To Document :
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