DocumentCode :
1106107
Title :
Low-resistance ohmic contacts to p-type GaAs using Zn/Pd/Au metallization
Author :
Brooks, R.C. ; Chen, C.L. ; Chu, A. ; Mahoney, L.J. ; Mavroides, J.G. ; Manfra, M.J. ; Finn, M.C.
Author_Institution :
Raytheon Company, Lexington, MA
Volume :
6
Issue :
10
fYear :
1985
fDate :
10/1/1985 12:00:00 AM
Firstpage :
525
Lastpage :
527
Abstract :
We have fabricated the low resistance ohmic contacts to p-type GaAs. Specific contact resistances as low as 7 × 10-7Ω.cm2have been obtained for contacts prepared by heat treating Zn/Pd/Au metallizations deposited on p-type epitaxial GaAs layers with an acceptor concentration of 1.5 × 1019cm-3. These contacts are reproducible, simple to fabricate, exhibit excellent adhesion, and have a uniformly smooth surface morphology.
Keywords :
Adhesives; Contact resistance; Gallium arsenide; Gold; Metallization; Ohmic contacts; Resistance heating; Surface morphology; Surface treatment; Zinc;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26217
Filename :
1485370
Link To Document :
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