DocumentCode :
1106143
Title :
Scaled performance for submicron GaAs MESFET´s
Author :
Yokoyama, K. ; Tomizawa, M. ; Yoshii, A.
Author_Institution :
University of Illinois, Urbana, IL
Volume :
6
Issue :
10
fYear :
1985
fDate :
10/1/1985 12:00:00 AM
Firstpage :
536
Lastpage :
538
Abstract :
Scaling schemes for GaAs MESFET´s below the submicron gate length are proposed. The corresponding switching times are calculated accurately down to 0.25µm gate length devices using an ensemble Monte Carlo simulation program. It is demonstrated that the proposed scaled devices offer ultrashort switching time due to the nonstationary carrier transport effects.
Keywords :
Degradation; Doping; Electron mobility; Gallium arsenide; Impurities; MESFETs; Optical scattering; Particle scattering; Threshold voltage; Voltage control;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1985.26221
Filename :
1485374
Link To Document :
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