Title :
Scaled performance for submicron GaAs MESFET´s
Author :
Yokoyama, K. ; Tomizawa, M. ; Yoshii, A.
Author_Institution :
University of Illinois, Urbana, IL
fDate :
10/1/1985 12:00:00 AM
Abstract :
Scaling schemes for GaAs MESFET´s below the submicron gate length are proposed. The corresponding switching times are calculated accurately down to 0.25µm gate length devices using an ensemble Monte Carlo simulation program. It is demonstrated that the proposed scaled devices offer ultrashort switching time due to the nonstationary carrier transport effects.
Keywords :
Degradation; Doping; Electron mobility; Gallium arsenide; Impurities; MESFETs; Optical scattering; Particle scattering; Threshold voltage; Voltage control;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1985.26221