• DocumentCode
    1107079
  • Title

    Numerical analysis of switching characteristics in SOI MOSFET´s

  • Author

    Kat, Koichi ; Taniguchi, Kenji

  • Author_Institution
    Toshiba Corporation, Komukai-toshiba-cho, Kawasaki, Japan
  • Volume
    33
  • Issue
    1
  • fYear
    1986
  • fDate
    1/1/1986 12:00:00 AM
  • Firstpage
    133
  • Lastpage
    139
  • Abstract
    The paper presents an analysis of switching characteristics in SOI MOSFET´s. By using a two-carrier and two-dimensional transient SOI simulator, calculated waveforms having good agreement with experimental results are obtained. Further analysis revealed the mechanism of switching characteristics. The motion of majority carriers features the switching characteristics for SOI devices in both turn-on and turn-off stages, although the current overshooting time and the substrate potential recovery time are strongly affected by bias conditions. The magnitude of drain current overshoot in the turn-on stage also proved to be a function of substrate impurity concentration.
  • Keywords
    Circuit synthesis; Electric potential; Electric variables; Impact ionization; Impurities; MOSFET circuits; Numerical analysis; Silicon; Steady-state; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22449
  • Filename
    1485666