DocumentCode
1107079
Title
Numerical analysis of switching characteristics in SOI MOSFET´s
Author
Kat, Koichi ; Taniguchi, Kenji
Author_Institution
Toshiba Corporation, Komukai-toshiba-cho, Kawasaki, Japan
Volume
33
Issue
1
fYear
1986
fDate
1/1/1986 12:00:00 AM
Firstpage
133
Lastpage
139
Abstract
The paper presents an analysis of switching characteristics in SOI MOSFET´s. By using a two-carrier and two-dimensional transient SOI simulator, calculated waveforms having good agreement with experimental results are obtained. Further analysis revealed the mechanism of switching characteristics. The motion of majority carriers features the switching characteristics for SOI devices in both turn-on and turn-off stages, although the current overshooting time and the substrate potential recovery time are strongly affected by bias conditions. The magnitude of drain current overshoot in the turn-on stage also proved to be a function of substrate impurity concentration.
Keywords
Circuit synthesis; Electric potential; Electric variables; Impact ionization; Impurities; MOSFET circuits; Numerical analysis; Silicon; Steady-state; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22449
Filename
1485666
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