• DocumentCode
    1107159
  • Title

    A threshold voltage expression for small-size MOSFET´s based on an approximate three-dimensional analysis

  • Author

    Wang, Cheng T.

  • Author_Institution
    California State University, Long Beach, CA
  • Volume
    33
  • Issue
    1
  • fYear
    1986
  • fDate
    1/1/1986 12:00:00 AM
  • Firstpage
    160
  • Lastpage
    164
  • Abstract
    A simple threshold voltage expression based on an approximate three-dimensional analysis has been obtained for MOSFET´s with the LOCOS isolation structure. It predicts both the short-channel and the narrow-width effects on the threshold voltage of MOSFET´s, and the results match the experimental data. In addition, the threshold expression is more general than any other existing models. It includes all the relevant device parameters, such as the drain voltage, the oxide and surface charges, and the fringe field through the oxide sidewalls.
  • Keywords
    Application software; Computer interfaces; Computer simulation; Contacts; Dielectric constant; Neodymium; Poisson equations; Threshold voltage; Uncertainty; Virtual manufacturing;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22456
  • Filename
    1485673