DocumentCode
1107159
Title
A threshold voltage expression for small-size MOSFET´s based on an approximate three-dimensional analysis
Author
Wang, Cheng T.
Author_Institution
California State University, Long Beach, CA
Volume
33
Issue
1
fYear
1986
fDate
1/1/1986 12:00:00 AM
Firstpage
160
Lastpage
164
Abstract
A simple threshold voltage expression based on an approximate three-dimensional analysis has been obtained for MOSFET´s with the LOCOS isolation structure. It predicts both the short-channel and the narrow-width effects on the threshold voltage of MOSFET´s, and the results match the experimental data. In addition, the threshold expression is more general than any other existing models. It includes all the relevant device parameters, such as the drain voltage, the oxide and surface charges, and the fringe field through the oxide sidewalls.
Keywords
Application software; Computer interfaces; Computer simulation; Contacts; Dielectric constant; Neodymium; Poisson equations; Threshold voltage; Uncertainty; Virtual manufacturing;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22456
Filename
1485673
Link To Document