• DocumentCode
    1107170
  • Title

    Substrate bias effects on transiently triggered latchup in bulk CMOS

  • Author

    Chang, Leon ; Berg, John

  • Author_Institution
    Standard Microsystems Corporation, Hauppauge, NY
  • Volume
    33
  • Issue
    1
  • fYear
    1986
  • fDate
    1/1/1986 12:00:00 AM
  • Firstpage
    165
  • Lastpage
    167
  • Abstract
    Bulk and p+/p-epitaxial CMOS wafers with and without off-chip substrate bias generation have been examined for latchup immunity to ramped power excitation and transient spike. It is found that a substrate bias applied to a topside contact is more effective than to a backside contact in producing a latchup-free operation. Epitaxial silicon is found to be superior to the nonepitaxial case. A lumped-element model is used to derive the holding voltage and explain the observations.
  • Keywords
    CMOS process; Circuits; Power measurement; Pulse generation; Pulse measurements; Semiconductor device modeling; Substrates; Testing; Thyristors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22457
  • Filename
    1485674