DocumentCode :
1107312
Title :
Effective mass in picosecond laser-produced high-density plasma in silicon
Author :
Yang, Guo-zhen ; Bloembergen, N.
Author_Institution :
Harvard Univ., Cambridge, MA, USA
Volume :
22
Issue :
1
fYear :
1986
fDate :
1/1/1986 12:00:00 AM
Firstpage :
195
Lastpage :
196
Abstract :
Picosecond laser-produced plasmas in silicon attain carrier densities of about 1021/cm3and temperatures of up to the melting point of about 1700 K. The optical data indicate only a slight increase of about 20 percent in the optical effective mass from the value at low density and room temperature. A simple model calculation is presented which confirms this behavior.
Keywords :
Semiconductor plasmas; Silicon materials/devices; Ultrafast optics; Charge carrier density; Effective mass; Electrons; Particle beam optics; Plasma density; Plasma immersion ion implantation; Plasma temperature; Silicon; Sprites (computer); Temperature dependence;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1986.1072853
Filename :
1072853
Link To Document :
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