DocumentCode :
1107536
Title :
Determination of contact parameters of interconnecting layers in VLSI circuits
Author :
Reeves, Geoffrey ; Harrison, H. Barry
Author_Institution :
Telecom Australia Research Laboratories, Victoria, Australia
Volume :
33
Issue :
3
fYear :
1986
fDate :
3/1/1986 12:00:00 AM
Firstpage :
328
Lastpage :
334
Abstract :
This paper presents a generalized electrical model of the interlayer contacts in integrated circuits and discusses various test structures capable of providing experimental data on the contacts. The techniques used for obtaining the specific contact resistance for the contacts and, where appropriate, the modification to conducting layer resistivities due to interactions Within the contact area are outlined. Using one of the techniques, experimental data on a polysilicon to single-crystal silicon contact is used as an example to obtain contact information. These results are discussed along with the experimental limitations applicable to the various techniques.
Keywords :
Australia; Contact resistance; Electric resistance; Geometry; Integrated circuit interconnections; Integrated circuit modeling; Laboratories; Neodymium; Silicon; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22491
Filename :
1485708
Link To Document :
بازگشت