DocumentCode
1107563
Title
Electrooptic sampling in GaAs integrated circuits
Author
Kolner, Brian H. ; Bloom, David M.
Author_Institution
Hewlett-packard Labs., Palo Alto, CA, USA
Volume
22
Issue
1
fYear
1986
fDate
1/1/1986 12:00:00 AM
Firstpage
79
Lastpage
93
Abstract
Electrooptic sampling has been shown to be a very powerful technique for making time-domain measurements of fast electronic devices and circuits. Previous embodiments relied on a hybrid connection between the device under test and a transmission line deposited on an electrooptic substrate such as LiTaO3 . The hybrid nature of this approach leads to device packaging difficulties and can result in measurement inaccuracies and performance degradation at very high frequencies. Since GaAs is electrooptic and an attractive material for high speed devices, we have devised an approach of direct electrooptic sampling of voltage waveforms in the host semiconductor. In this paper, we review the principles and limitations of electrooptic sampling and discuss this new noninvasive technique for electronic probing with applications to characterizing high speed GaAs circuits and devices.
Keywords
Electrooptic materials/devices; FET integrated circuits; MMICs; Monolithic microwave integrated circuits (MMICs); Sampling methods; Ultrafast optics; Circuit testing; Distributed parameter circuits; Electrooptic devices; Gallium arsenide; Integrated circuit measurements; Power transmission lines; Sampling methods; Substrates; Time domain analysis; Transmission line measurements;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1986.1072877
Filename
1072877
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