DocumentCode
1108028
Title
Characterization of InGaAs/AlGaAs pseudomorphic modulation-doped field-effect transistors
Author
Ketterson, Andrew A. ; Masselink, William T. ; Gedymin, Jon S. ; Klem, John ; Peng, Chin-Kun ; Kopp, William F. ; Morkoc, Hadis ; Gleason, K.R.
Author_Institution
University of Illinois at Urbana-Champaign, Urbana, IL
Volume
33
Issue
5
fYear
1986
fDate
5/1/1986 12:00:00 AM
Firstpage
564
Lastpage
571
Abstract
High-performance pseudomorphic Iny Ga1-y As/Al0.15 - Ga0.85 As (
) MODFET\´s grown by MBE have been characterized at dc (300 and 77 K) and RF frequencies. Transconductances as high as 310 and 380 mS/mm and drain currents as high as 290 and 310 mA/mm were obtained at 300 and 77 K, respectively, for 1-µm gate lengths and 3-µm source-drain spacing devices. Lack of persistent trapping effects,
collapse, and threshold voltage shifts observed with these devices are attributed to the use of low mole fraction Alx Ga1-x As while still maintaining 2DEG concentrations of about 1.3 × 1012cm-2. Detailed microwave S-parameter measurements indicate a current gain cut-off frequency Of 24.5 GHz When
, which is as much as 100 percent better than similar GaAs/AlGaAs MODFET structures, and a maximum frequency of oscillation of 40 GHz. These superior results are in part due to the higher electron velocity of InGaAs as compared with GaAs. Velocity field measurement performed up to 3 kV/cm using the magnetoresistance method indicates an electron saturation velocity of greater than 1.7 × 107cm/s at 77 K for
, which is 20 percent higher than GaAs/AlGaAs MODFET\´s of similar structure.
) MODFET\´s grown by MBE have been characterized at dc (300 and 77 K) and RF frequencies. Transconductances as high as 310 and 380 mS/mm and drain currents as high as 290 and 310 mA/mm were obtained at 300 and 77 K, respectively, for 1-µm gate lengths and 3-µm source-drain spacing devices. Lack of persistent trapping effects,
collapse, and threshold voltage shifts observed with these devices are attributed to the use of low mole fraction Al
, which is as much as 100 percent better than similar GaAs/AlGaAs MODFET structures, and a maximum frequency of oscillation of 40 GHz. These superior results are in part due to the higher electron velocity of InGaAs as compared with GaAs. Velocity field measurement performed up to 3 kV/cm using the magnetoresistance method indicates an electron saturation velocity of greater than 1.7 × 107cm/s at 77 K for
, which is 20 percent higher than GaAs/AlGaAs MODFET\´s of similar structure.Keywords
Cutoff frequency; Electrons; Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Radio frequency; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22533
Filename
1485750
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