• DocumentCode
    1108328
  • Title

    Gain control operation of a four-terminal p-n-p In0.53Ga0.47As/InP junction field-effect transistor grown by molecular-beam epitaxy

  • Author

    Cheng, Julian ; Forrest, Stephen R. ; Guth, G. ; Wunder, R.

  • Author_Institution
    AT&T Bell Laboratories, Murray Hill, NJ
  • Volume
    33
  • Issue
    6
  • fYear
    1986
  • fDate
    6/1/1986 12:00:00 AM
  • Firstpage
    725
  • Lastpage
    729
  • Abstract
    A four-terminal epitaxial p-n-p junction field-effect transistor grown by molecular-beam epitaxy is shown to be an effective one-component gain control element when operated as a four-terminal device. Control of amplifier gain is demonstrated by using the back-gate terminal to adjust the transconductance of a standard three-terminal transistor. The effect of parasitic capacitance on amplifier gain and cutoff frequency is described for a common-source configuration.
  • Keywords
    Buffer layers; FETs; Gain control; Hysteresis; Indium phosphide; Molecular beam epitaxial growth; P-n junctions; Parasitic capacitance; Substrates; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22560
  • Filename
    1485777