DocumentCode :
1108328
Title :
Gain control operation of a four-terminal p-n-p In0.53Ga0.47As/InP junction field-effect transistor grown by molecular-beam epitaxy
Author :
Cheng, Julian ; Forrest, Stephen R. ; Guth, G. ; Wunder, R.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
Volume :
33
Issue :
6
fYear :
1986
fDate :
6/1/1986 12:00:00 AM
Firstpage :
725
Lastpage :
729
Abstract :
A four-terminal epitaxial p-n-p junction field-effect transistor grown by molecular-beam epitaxy is shown to be an effective one-component gain control element when operated as a four-terminal device. Control of amplifier gain is demonstrated by using the back-gate terminal to adjust the transconductance of a standard three-terminal transistor. The effect of parasitic capacitance on amplifier gain and cutoff frequency is described for a common-source configuration.
Keywords :
Buffer layers; FETs; Gain control; Hysteresis; Indium phosphide; Molecular beam epitaxial growth; P-n junctions; Parasitic capacitance; Substrates; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22560
Filename :
1485777
Link To Document :
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