DocumentCode
1108328
Title
Gain control operation of a four-terminal p-n-p In0.53 Ga0.47 As/InP junction field-effect transistor grown by molecular-beam epitaxy
Author
Cheng, Julian ; Forrest, Stephen R. ; Guth, G. ; Wunder, R.
Author_Institution
AT&T Bell Laboratories, Murray Hill, NJ
Volume
33
Issue
6
fYear
1986
fDate
6/1/1986 12:00:00 AM
Firstpage
725
Lastpage
729
Abstract
A four-terminal epitaxial p-n-p junction field-effect transistor grown by molecular-beam epitaxy is shown to be an effective one-component gain control element when operated as a four-terminal device. Control of amplifier gain is demonstrated by using the back-gate terminal to adjust the transconductance of a standard three-terminal transistor. The effect of parasitic capacitance on amplifier gain and cutoff frequency is described for a common-source configuration.
Keywords
Buffer layers; FETs; Gain control; Hysteresis; Indium phosphide; Molecular beam epitaxial growth; P-n junctions; Parasitic capacitance; Substrates; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22560
Filename
1485777
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