DocumentCode
1108453
Title
Responsivity of ion-implanted p-n junction in a GaAs electroabsorption avalanche detector
Author
Zuleeg, Rainer
Author_Institution
McDonnell Douglas Microelectronics Center, Huntington Beach, CA
Volume
33
Issue
6
fYear
1986
fDate
6/1/1986 12:00:00 AM
Firstpage
799
Lastpage
801
Abstract
The performance characteristics of an ion-implanted p-n junction electroabsorption avalanche detector (EAD) are reported. Wtih avalanche-assisted multiplication, the optical gain reaches value of over 500 and the devices achieved a peak responsibility of 200 A/W at a wavelength of 0.88 µm. Owing to the combination of the Franz-Keldysh effect with avalanche multiplication, a narrowband, i.e., self-filtering, response of 50 nm full-width half-magnitude was demonstrated. With a 50-Ω load the pulse response of this large-area EAD, i.e., 1.6 × 10-2cm2, is about 5-10 ns and is RC time constant limited.
Keywords
Absorption; Avalanche photodiodes; Charge carrier processes; Detectors; Fiber lasers; Gallium arsenide; Narrowband; Optical sensors; P-n junctions; Schottky diodes;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1986.22571
Filename
1485788
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