• DocumentCode
    1108759
  • Title

    Transmission line modeling of substrate resistances and CMOS latchup

  • Author

    Troutman, Ronald R. ; Hargrove, Michael J.

  • Author_Institution
    IBM General Technology Division, Essex, Junction, VT
  • Volume
    33
  • Issue
    7
  • fYear
    1986
  • fDate
    7/1/1986 12:00:00 AM
  • Firstpage
    945
  • Lastpage
    954
  • Abstract
    Substrate resistance in epitaxial-CMOS is more appropriately viewed as a lossy transmission line than as a lumped resistor or as a resistance ladder network. Lossy transmission lines can be used to model a variety of substrate resistance configurations, including the resistance necessary to quantitatively predict turn on of the lateral parasitic bipolar during latchup. Voltage and current distributions predicted by the transmission line model are in excellent agreement with two-dimensional numerical simulations. Parameter values for the model are easily related to vertical doping profiles and to a wide variety of parasitic p-n-p-n layouts. For CMOS design the lateral bipolar´s bypass resistor, commonly found in lumped element models of the parasitic p-n-p-n, is replaced by a transfer resistance derived from the transmission line model. Butted substrate contacts are shown to provide a worst-case design situation.
  • Keywords
    Current distribution; Numerical simulation; Predictive models; Propagation losses; Resistors; Semiconductor device modeling; Semiconductor process modeling; Substrates; Transmission lines; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22600
  • Filename
    1485817