DocumentCode :
1108830
Title :
A New Method to Extract Bulk Carrier Mobility in Germanium-on-Insulator
Author :
Jin, Hai-Yan ; Cheung, Nathan W.
Author_Institution :
Univ. of California, Berkeley
Volume :
55
Issue :
5
fYear :
2008
fDate :
5/1/2008 12:00:00 AM
Firstpage :
1250
Lastpage :
1254
Abstract :
A new method is presented to extract bulk carrier mobility of germanium-on-insulator (GeOI) films based on the data from the depletion mode of four-point probe pseudo-MOSFET measurement. Analytical models of the conductance in depletion region and related parameter extraction procedures are presented. This method is validated with both GeOI and silicon-on-insulator substrates prepared by layer transfer.
Keywords :
MOSFET; carrier mobility; germanium; silicon-on-insulator; bulk carrier mobility; four-point probe pseudo-MOSFET measurement; germanium-on-insulator; layer transfer; parameter extraction procedures; silicon-on-insulator substrates; Contact resistance; Data mining; Dielectric substrates; MOSFET circuits; Plasma applications; Plasma temperature; Probes; Silicon on insulator technology; Voltage; Wafer bonding; Characterization; germanium; germanium-on-insulator (GeOI); measurement; mobility; pseudo-MOSFET; silicon-on-insulator (SOI); unibond;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.919301
Filename :
4475505
Link To Document :
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