DocumentCode :
1108834
Title :
HCI Lifetime Correction Based on Self-Heating Characterization for SOI Technology
Author :
Roux, Julien-Marc ; Federspiel, Xavier ; Roy, D. ; Abramowitz, P..
Author_Institution :
STMicroelectron., Crolles
Volume :
7
Issue :
2
fYear :
2007
fDate :
6/1/2007 12:00:00 AM
Firstpage :
217
Lastpage :
224
Abstract :
Self-heating (SH) effects, which were observed during the development of silicon-on-insulator (SOI) technology for high-performance circuits, raise questions concerning the validity of the extrapolation method used for hot carrier injection (HCI). In this paper, we propose a new methodology for lifetime prediction based on DC HCI stress for SOI technology. The SH is quantified using coupled DC HCI stress and gate resistance measurements for different transistor widths. Then, the degradation part due to SH is removed, enabling accurate HCI lifetime prediction when SH effects are present.
Keywords :
MOSFET; carrier lifetime; extrapolation; hot carriers; semiconductor device models; silicon-on-insulator; thermal resistance; thermal stresses; MOS transistor devices; SOI technology; coupled DC HCI stress; extrapolation method; gate resistance measurements; high-performance circuits; hot carrier injection lifetime correction; self-heating characterization; silicon-on-insulator technology; Electrical resistance measurement; Extrapolation; Human computer interaction; Immune system; Silicon on insulator technology; Stress measurement; Temperature; Thermal conductivity; Thermal resistance; Thermal stresses; Hot carrier injection (HCI); self-heating (SH); silicon-on-insulator (SOI); thermal coefficient resistance (TCR); thermal resistance;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2007.902076
Filename :
4295100
Link To Document :
بازگشت