DocumentCode
1108853
Title
Systematic Study of the Dopant-Dependent Properties of Electrically Programmable Fuses With Silicided Poly-Si Links Through a Series of I– V Measurements
Author
Suto, Hiroyuki ; Mori, Shigetaka ; Kanno, Michihiro ; Nagashima, Naoki
Author_Institution
Sony Corp., Atsugi
Volume
7
Issue
2
fYear
2007
fDate
6/1/2007 12:00:00 AM
Firstpage
285
Lastpage
297
Abstract
Electrically programmable/writable fuses (e-fuses) with a Ni-silicided polycrystalline silicon narrow link and fabricated with four doping conditions were studied using two successive I-V measurements. The initial I-V sweeps can change e-fuses into targeted programmed states and display all of the programming processes where the currents change by many orders of magnitude. The second set of I-V curves can show stability and conduction in the programmed states for both bias polarities. Through the series of I-V measurements, the two-step programming with moderate blowing conditions could be reproduced and studied systematically. The programming processes of incompletely programmed states, before complete programming (CP), were found to be strongly dependent on the dopant conditions. The origin of the dopant dependency was considered within a simple electrical equivalent circuit model. At least two or three programmed states were identified among the completely programmed states in terms of the characteristic spreads of the final resistance and conduction behavior. The most distinctive currents after CP are similar to those in varistors. The stability of every programmed state is strongly dependent on the dopant conditions.
Keywords
electric fuses; equivalent circuits; integrated circuit measurement; semiconductor doping; silicon; I-V measurements; Ni-silicided polycrystalline silicon links; conduction behavior; dopant-dependent properties; doping condition; e-fuses; electrically programmable fuses; equivalent circuit model; programmed states; two-step programming; Displays; Doping; Electric resistance; Electric variables measurement; Equivalent circuits; Fuses; Semiconductor process modeling; Silicon; Stability; Varistors; $I$ – $V$ measurement; Dopant; double Schottky barrier; electrically programmable fuse; electrically programmable/writable fuses (e-fuse); electromigration (EM); nickel silicide; programming; transmission line model; varistor;
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2007.901606
Filename
4295102
Link To Document