DocumentCode :
1108930
Title :
Analytical model for threshold voltage of ion-implanted short-channel IGFET´s
Author :
Mehta, S.K. ; Muralidharan, R.
Author_Institution :
Solid State Physics Laboratory, Delhi, India
Volume :
33
Issue :
7
fYear :
1986
fDate :
7/1/1986 12:00:00 AM
Firstpage :
1073
Lastpage :
1074
Abstract :
An analytical model for the threshold voltage for ion-implanted short-channel IGFET´s is presented. The coupled two-dimensional Poisson´s equation under the gate is solved rigorously. A closed-form analytical expression is derived for threshold voltage as a function of the material parameters and device geometry.
Keywords :
Analytical models; Boundary conditions; Doping profiles; Geometry; Permittivity; Poisson equations; Region 1; Region 2; Silicon; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22615
Filename :
1485832
Link To Document :
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