DocumentCode :
1109598
Title :
Two-dimensional numerical simulation of Fermi-level pinning phenomena due to DX centers in AlGaAs/GaAs HEMTs
Author :
Mizuta, Hiroshi ; Yamaguchi, Ken ; Yamane, Masao ; Tanoue, Tomonori ; Takahashi, Susumu
Author_Institution :
Hitachi Ltd., Tokyo, Japan
Volume :
36
Issue :
10
fYear :
1989
fDate :
10/1/1989 12:00:00 AM
Firstpage :
2307
Lastpage :
2314
Abstract :
Fermi-level pinning phenomena due to DX centers in AlGaAs/GaAs HEMTs (high electron mobility transistors) are analyzed using two-dimensional numerical simulation based on a drift-diffusion model. A DX center model is introduced assuming Fermi-Dirac statistics for ionized donor density with the aluminum mole fraction dependence of the deep-donor energy level. The calculated results reveal that the decrease in transconductance of AlGaAs/GaAs HEMTs in a high-gate-bias region is caused by the existence of DX centers. This is because the Fermi level is pinned at deep-donor levels in the n-AlGaAs layer. Furthermore, the superiority of AlGaAs/InGaAs pseudomorphic HEMTs is discussed in terms of the Fermi-level pinning
Keywords :
Fermi level; III-V semiconductors; aluminium compounds; deep levels; gallium arsenide; high electron mobility transistors; semiconductor device models; AlGaAs-GaAs; AlGaAs-InGaAs; DX centers; Fermi-Dirac statistics; Fermi-level pinning phenomena; HEMTs; deep-donor energy level; drift-diffusion model; high electron mobility transistors; high-gate-bias region; ionized donor density; transconductance; two-dimensional numerical simulation; Aluminum; Energy states; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Numerical simulation; PHEMTs; Statistics; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40915
Filename :
40915
Link To Document :
بازگشت