Title :
Hot-electron effects on channel thermal noise in fine-line NMOS field-effect transistors
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
fDate :
9/1/1986 12:00:00 AM
Abstract :
Submicrometer NMOSFET´s exhibit excess channel thermal noise. This excess noise increases with an increase in drain-to-source voltage and a decrease in channel length. A strong correlation between high electric field and excess noise strongly suggests hot electrons as being responsible for this excess noise.
Keywords :
FETs; Frequency measurement; Heating; Hot carriers; MOS devices; MOSFET circuits; Noise measurement; Silicon; Testing; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1986.22680