DocumentCode :
1109627
Title :
Hot-electron effects on channel thermal noise in fine-line NMOS field-effect transistors
Author :
Jindal, R.P.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
Volume :
33
Issue :
9
fYear :
1986
fDate :
9/1/1986 12:00:00 AM
Firstpage :
1395
Lastpage :
1397
Abstract :
Submicrometer NMOSFET´s exhibit excess channel thermal noise. This excess noise increases with an increase in drain-to-source voltage and a decrease in channel length. A strong correlation between high electric field and excess noise strongly suggests hot electrons as being responsible for this excess noise.
Keywords :
FETs; Frequency measurement; Heating; Hot carriers; MOS devices; MOSFET circuits; Noise measurement; Silicon; Testing; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1986.22680
Filename :
1485897
Link To Document :
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