Title :
Trimming phase and birefringence errors in planar lightwave circuits with deep ultraviolet femtosecond laser
Author :
Chen, Q. ; Chen, K.P. ; Buric, M. ; Nikumb, S.
Author_Institution :
Integrated Manuf. Technol. Inst., Nat. Res. Council of Canada, London, Ont., Canada
Abstract :
A deep ultraviolet femtosecond laser was employed to trim phase and birefringence errors in silica planar lightwave circuits. A permanent refractive index change of ∼3.8×10-4 and a birefringence change of 1.0×10-4 were induced in hydrogen-free Mach-Zehnder planar waveguide circuits. The ultrafast laser enhances the ultraviolet photosensitivity response in silica waveguides by two orders of magnitude greater than that of a nanosecond 248 nm KrF excimer laser.
Keywords :
Mach-Zehnder interferometers; birefringence; errors; high-speed optical techniques; laser beam machining; optical planar waveguides; refractive index; silicon compounds; KrF excimer laser; SiO2; birefringence errors; deep ultraviolet femtosecond laser; hydrogen free Mach-Zehnder planar waveguide circuit; planar lightwave circuits; refractive index; silica waveguies; trimming phase errors; ultraviolet photosensitivity;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20045975
