• DocumentCode
    1110775
  • Title

    IIIB-5 recessed Silo—A submicrometer VLSI isolation technology

  • Author

    Hui, John ; Voorde, P.V. ; Moll, Jonas

  • Volume
    33
  • Issue
    11
  • fYear
    1986
  • fDate
    11/1/1986 12:00:00 AM
  • Firstpage
    1848
  • Lastpage
    1848
  • Keywords
    Anisotropic magnetoresistance; Etching; Isolation technology; Laboratories; Lithography; MOSFET circuits; Oxidation; Silicon; Transconductance; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1986.22785
  • Filename
    1486002