Title :
An 83% enhancement in the external quantum efficiency of ultraviolet flip-chip light-emitting diodes with the incorporation of a self-textured oxide mask
Author :
Kun-Ching Shen ; Wen-Yu Lin ; Dong-Sing Wuu ; Shih-Yung Huang ; Kuo-Sheng Wen ; Shih-Feng Pai ; Liang-Wen Wu ; Horng, Ray-Hua
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
Abstract :
We demonstrate here a 380-nm ultraviolet InGaN flip-chip (FC) light-emitting diode (LED) with self-textured oxide mask (STOM-FCLED) structures fabricated in a large-area (1125 × 1125 μm2) FC configuration. An 83% enhancement in the external quantum efficiency was achieved for the STOMFCLEDs when compared with FCLEDs without the STOM structure operating at an injection current of 350 mA. For STOM-FCLEDs operating at an injection current of 1000 mA, a light output of approximately 400 mW was obtained. These results could be attributed to the introduction of the STOM structure, which not only reduces the density of threading dislocation but also intensifies the LED light extraction.
Keywords :
III-V semiconductors; dislocations; flip-chip devices; gallium compounds; indium compounds; light emitting diodes; masks; nanofabrication; quantum optics; wide band gap semiconductors; LED light extraction; STOM-FCLED structures; current 1000 mA; current 350 mA; external quantum efficiency; injection current; large-area FC configuration; self-textured oxide mask incorporation; self-textured oxide mask structures; size 380 nm; threading dislocation density; ultraviolet FC LED; ultraviolet flip-chip light-emitting diodes; Arrays; Educational institutions; Gallium nitride; Light emitting diodes; Luminescence; Power generation; Substrates; External quantum efficiency (EQE); GaN; light-emitting diode (LED); ultraviolet (UV) generation;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2228462