Title :
44-GHz monolithic GaAs FET amplifier
Author :
Kim, B. ; Tserng, H.Q. ; Shih, H.D.
Author_Institution :
Texas Instruments Incorporated, Central Research Laboratories, Dallas, TX
fDate :
2/1/1986 12:00:00 AM
Abstract :
Millimeter-wave monolithic GaAs FET amplifiers have been developed. These amplifiers were fabricated using FET´s with MBE-grown active layers and electron-beam defined sub-half-micrometer gates. Source groundings are provided through very low inductance via holes. The single-stage amplifier has achieved over a 10-dB gain at 44 GHz. A 300-µm gate-width amplifier has achieved an output power of 60 mW with a power density of 0.2 W per millimeter of gate width.
Keywords :
Epitaxial layers; Etching; FETs; Fabrication; Gallium arsenide; Grounding; Inductance; Millimeter wave circuits; Millimeter wave technology; Power amplifiers;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1986.26306