DocumentCode :
1112496
Title :
Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture
Author :
Nighan, William L. ; Sauerbrey, Roland A. ; Zhu, Yunping ; Tittel, Frank K. ; Wilson, William L., Jr.
Author_Institution :
United Technologies Research Center, East Hartford, CT, USA
Volume :
23
Issue :
2
fYear :
1987
fDate :
2/1/1987 12:00:00 AM
Firstpage :
253
Lastpage :
261
Abstract :
Use of a two-component buffer gas comprised of Ar and Kr results in electron-beam excited XeF( C \\rightarrow A ) laser pulse energy and intrinsic efficiency values comparable to those of UV rare gas-halide lasers. Herein we report measurements of transient absorption confirming that the primary effect of a buffer comprised of Ar and Kr is a significantly lower level of ionized and excited species that absorb in the blue-green spectral region. Spectral analysis of a variety of mixtures shows that the Ar-Kr buffer also benefits XeF( C \\rightarrow A ) laser performance due to an increase in gain in the 400-450 nm region caused by the presence of the Kr2F excimer. In addition, a large increase in absorption at ∼ 351 nm, also due to Kr2F, suppresses oscillation on the competitive XeF( B \\rightarrow X ) transition and, for certain conditions, makes efficient simultaneous oscillation of the XeF( B \\rightarrow X ) and XeF( C \\rightarrow A ) laser transitions possible.
Keywords :
Noble-gas lasers; Pulsed lasers; Argon; Electromagnetic wave absorption; Gas lasers; Helium; Laser excitation; Laser stability; Laser transitions; Optical pulses; Power lasers; Spectral analysis;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1987.1073314
Filename :
1073314
Link To Document :
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