• DocumentCode
    1112575
  • Title

    Fabrication and optical-switching results of the double-gate static-induction thyristor with the first planar-gate and the second buried-gate structure

  • Author

    Nishizawa, J.-I. ; Tamamushi, T. ; Nonaka, K. ; Shimomura, S.

  • Author_Institution
    Tohoku University, Sendai, Japan
  • Volume
    7
  • Issue
    3
  • fYear
    1986
  • fDate
    3/1/1986 12:00:00 AM
  • Firstpage
    175
  • Lastpage
    178
  • Abstract
    A new thyristor structure-a class of the double-gate (DG) static-induction (SI) thyristors-was fabricated and showed quick dual-gate current controllability and less turn-off tailing current, because the anode current can be controlled by both the first and the second gate and the electrons stored at the second gate can be discharged through the second gate circuit in a very short time at the turn-off process. Moreover, the DG SI thyristors have a capability of lower forward voltage drop and faster switching speed than those values of the single-gate SI thyristor.
  • Keywords
    Anodes; Cathodes; Charge carrier processes; Circuits; Controllability; Doping; Electrons; Optical device fabrication; Thyristors; Voltage control;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1986.26335
  • Filename
    1486158