• DocumentCode
    1112877
  • Title

    Exact solution for the kinetics of the image reversal process

  • Author

    Babu, S.V.

  • Author_Institution
    Clarkson University, Potsdam, NY
  • Volume
    7
  • Issue
    4
  • fYear
    1986
  • fDate
    4/1/1986 12:00:00 AM
  • Firstpage
    250
  • Lastpage
    251
  • Abstract
    The model equations describing the image reversal process with positive photoresists have been solved by extending the recently derived analytical solution of Dill´s equations for the exposure bleaching of positive photoresists. The solution is presented in a closed form that requires only simple numerical integrations to determine the time-dependent two-dimensional concentration profiles of the photoactive compound (PAC).
  • Keywords
    Bleaching; Closed-form solution; Doping; Equations; Floods; Helium; Image analysis; Kinetic theory; Resists; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1986.26361
  • Filename
    1486184
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1112877