Title :
Exact solution for the kinetics of the image reversal process
Author_Institution :
Clarkson University, Potsdam, NY
fDate :
4/1/1986 12:00:00 AM
Abstract :
The model equations describing the image reversal process with positive photoresists have been solved by extending the recently derived analytical solution of Dill´s equations for the exposure bleaching of positive photoresists. The solution is presented in a closed form that requires only simple numerical integrations to determine the time-dependent two-dimensional concentration profiles of the photoactive compound (PAC).
Keywords :
Bleaching; Closed-form solution; Doping; Equations; Floods; Helium; Image analysis; Kinetic theory; Resists; Thermal resistance;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1986.26361
