DocumentCode
111396
Title
High Overload Pressure Sensor Construct With Polysilicon Nanofilm
Author
Chuai Rongyan ; Wang Jian ; Yi Chang ; Dai Quan ; Yang Lijian
Author_Institution
Sch. of Inf. Sci. & Eng., Shenyang Univ. of Technol., Shenyang, China
Volume
15
Issue
3
fYear
2015
fDate
Mar-15
Firstpage
1414
Lastpage
1420
Abstract
A high overload pressure sensor is prepared by surface micromachined technology, and its full scale pressure is 2.5 MPa. The structure of the proposed sensor is based on a seal cavity made by sacrificial layer, a deposition of polysilicon nanofilm acts as piezoresistors on the diaphragm. The stress distribution of the diaphragm of the sensor is simulated by the large displacement static analysis and the nonlinear contact analysis. Due to polysilicon high tensile strength and appropriate cavity height, the sensor full scale output voltage and overload capacity is greatly improved. The measured results indicate that the overpressure of the sensor sample is seven times higher than its full-scale pressure, and its full scale output voltage is 362 mV with a supply voltage of 5 V.
Keywords
diaphragms; elemental semiconductors; micromachining; microsensors; nanosensors; nanostructured materials; pressure sensors; seals (stoppers); silicon; stress measurement; tensile strength; thin film sensors; Si; diaphragm; high overload pressure sensor; large displacement static analysis; nonlinear contact analysis; piezoresistor; polysilicon nanofilm deposition; pressure 2.5 MPa; sacrificial layer; seal cavity; stress distribution; surface micromachined technology; tensile strength; voltage 362 mV; voltage 5 V; Cavity resonators; Piezoresistive devices; Sensitivity; Sensors; Strain; Stress; Substrates; Pressure sensor; overload protection; polysilicon nanofilm; sacrificial layer;
fLanguage
English
Journal_Title
Sensors Journal, IEEE
Publisher
ieee
ISSN
1530-437X
Type
jour
DOI
10.1109/JSEN.2014.2363481
Filename
6926739
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