Title :
Real-space transfer and hot-electron transport properties in III-V semiconductor heterostructures
Author :
Sakamoto, Ryoji ; Akai, Kiyoyasu ; Inoue, Masataka
Author_Institution :
Dept. of Electr. Eng., Osaka Inst. of Technol., Japan
fDate :
10/1/1989 12:00:00 AM
Abstract :
Real-space transfer (RST) of hot electrons in heterostructures was studied using Monte Carlo simulations. Hot-electron distributions in real space were determined self-consistently by taking into account the space-charge field across the heterointerface. Using the analysis of hot-electron distributions in heterostructures, high-field transport properties are discussed from the viewpoint of heterostructure engineering. The simulations indicate that the effects of real-space transfer are strongly dependent on the energy band structure, doping density, and heterostructure parameters. It is also shown that InGaAs/InP is superior to GaAs/AlGaAs in terms of obtaining high velocity because RST reduces hot-electron distributions in the L and X valleys of InGaAs and increases the electron population in the Γ valley of InP. This is due to the suitable valley line-up in the InGaAs/InP heterostructure
Keywords :
III-V semiconductors; Monte Carlo methods; high field effects; hot carriers; semiconductor junctions; space charge; GaAs-AlGaAs; III-V semiconductor heterostructures; InGaAs-InP; Monte Carlo simulations; doping density; electron population; energy band structure; heterostructure engineering; high-field transport properties; hot-electron distributions; hot-electron transport properties; real space transfer; space-charge field; Chemical technology; Conductivity; Electron emission; Epitaxial layers; Gallium arsenide; III-V semiconductor materials; Indium gallium arsenide; Indium phosphide; Power engineering and energy; Thermionic emission;
Journal_Title :
Electron Devices, IEEE Transactions on