DocumentCode :
1114548
Title :
Amorphous-SiC thin-film p-i-n light-emitting diode using amorphous-SiN hot-carrier tunneling injection layers
Author :
Paasche, Sascha M. ; Toyama, Toshihiko ; Okamoto, Hiroaki ; Hamakawa, Yoshihiro
Author_Institution :
Fac. of Eng. Sci., Osaka Univ., Toyanaka, Japan
Volume :
36
Issue :
12
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2895
Lastpage :
2902
Abstract :
An approach to improve the luminosity of hydrogenated amorphous silicon carbide (a-SiC:H)-based thin-film visible light-emitting diodes is discussed. High bandgap near-stoichiometric hydrogenated amorphous silicon nitride (a-SiN:H) is utilized as a hot-carrier tunneling injection layer. An improvement of both carrier injection efficiency and luminosity is observed. Technical data on the new approach for carrier injection and on the recombination mechanism are presented. Preliminary results are also presented on the photoluminescence and electroluminescence properties of a-SiC:H/a-SiN:H multilayers
Keywords :
amorphous semiconductors; electroluminescence; hydrogen; light emitting diodes; p-i-n diodes; photoluminescence; silicon compounds; SiC:H-SiN:H multilayers; amorphous SiC thin film p-i-n light emitting diode; amorphous-SiN hot-carrier tunneling injection layers; carrier injection efficiency; electroluminescence; luminosity; photoluminescence; recombination mechanism; semiconductors; Amorphous silicon; Hot carrier injection; Hot carriers; Light emitting diodes; PIN photodiodes; Photoluminescence; Photonic band gap; Semiconductor thin films; Transistors; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40952
Filename :
40952
Link To Document :
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