DocumentCode :
1114618
Title :
Amorphous-silicon linear-array device technology; applications in electronic copying
Author :
Weisfield, Richard L.
Author_Institution :
Xerox Palo Alto Res. Center, CA, USA
Volume :
36
Issue :
12
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2935
Lastpage :
2939
Abstract :
For electronic-copying applications, amorphous silicon thin-film transistors (TFTs), photodiodes, and thin-film resistors are fabricated in a linear array on a glass substrate and mounted in an ionographic printing head. A document imaged on the array of photodiodes produces photocurrents which are amplified and converted to voltages on a corresponding array of output electrodes. These output electrodes are used to modulate the flow of ions exiting the printing head. This electronic copy function operates as a completely analog circuit, in that the output voltage (and therefore the modulation in ion current) is directly proportional to the light intensity impinging on each photodiode. The design and performance of this device are discussed
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; photocopying; photodiodes; silicon; thin film resistors; thin film transistors; Si:H linear array device technology; TFT; amorphous semiconductors; analog circuit; electronic copying; glass substrate; ionographic printing head; photocurrents; photodiodes; thin-film resistors; thin-film transistors; Amorphous silicon; Electrodes; Glass; Head; Photodiodes; Printing; Resistors; Semiconductor thin films; Thin film transistors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.40958
Filename :
40958
Link To Document :
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