DocumentCode :
1115163
Title :
Improved physical modeling of submicron MOSFETs based on parameter extraction using 2-D simulation
Author :
Hwang, Chang G. ; Dutton, Robert W.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., CA, USA
Volume :
8
Issue :
4
fYear :
1989
fDate :
4/1/1989 12:00:00 AM
Firstpage :
370
Lastpage :
379
Abstract :
Hot electron effects for n-channel submicron MOSFET devices have been analyzed on the basis of accurate physical models. The PISCES-Monte Carlo scheme is implemented to calculate impact ionization coefficients and predict accurately the generation of electron-hole pairs. The coupling scheme also provides important physical parameters and constants for developing substrate and gate current models as well as an improved mobility model, especially for high drain and gate bias conditions. The analytical models for impact ionization, thermionic emission and mobility are incorporated into the PISCES program and give accurate predictions compared with experimental results. These models predict the peak and saturated transconductance curves for the high drain voltage of LDD MOSFET devices
Keywords :
MOS integrated circuits; Monte Carlo methods; carrier mobility; electronic engineering computing; hot carriers; impact ionisation; insulated gate field effect transistors; semiconductor device models; thermionic emission; 2D simulation; LDD MOSFET devices; MOS ICs; PISCES program; PISCES-Monte Carlo scheme; coupling scheme; drift/diffusion analysis program; electron-hole pair generation; gate bias conditions; gate current models; high drain voltage; hot electron effects; impact ionization coefficients; lightly doped drain; mobility model; n-channel devices; parameter extraction; peak transconductance curve; physical modeling; saturated transconductance curves; submicron MOSFETs; substrate current model; thermionic emission; Analytical models; Charge carrier processes; Circuits; Degradation; Hot carriers; Impact ionization; MOSFETs; Parameter extraction; Predictive models; Substrate hot electron injection;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/43.29591
Filename :
29591
Link To Document :
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