DocumentCode
1115939
Title
InGaAsP InP current confinement mesa substrate buried heterostructure laser diode fabricated by one-step liquid-phase epitaxy
Author
Sugimoto, Mitsunori ; Suzuki, Akira ; Nomura, Hidenori ; Lang, Roy
Author_Institution
NEC Corporation, Miyamae-ku, Kawasaki-city, Japan
Volume
2
Issue
4
fYear
1984
fDate
8/1/1984 12:00:00 AM
Firstpage
496
Lastpage
503
Abstract
New InGaAsP/InP buried heterostructure laser diodes fabricated by one-step liquid-phase epitaxy are described, in which the InGaAsP active region completely embedded in InP is grown on the top of the mesa stripe formed on the InP substrate while, simultaneously, current confinement structure is automatically formed on both sides of the mesa stripe. These current confinement mesa substrate buried heterostructure laser diodes (CCM-LD´s) have current confinement structure which very effectively blocks unwanted leakage current bypassing the light emitting region which has enabled laser operation with a threshold current as low as 20 mA, 70-mW maximum CW output at room temperature, and 125°C maximum CW operation temperature. Life tests over 6000-h CW operation at 70°C and 5 mW/facet have confirmed good reliability of these devices.
Keywords
Gallium materials/lasers; Diode lasers; Epitaxial growth; Indium phosphide; Laser modes; Laser stability; Light sources; Optical fiber communication; Substrates; Temperature sensors; Threshold current;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.1984.1073634
Filename
1073634
Link To Document