DocumentCode
11164
Title
Dual-Stage Nanopositioning for High-Speed Scanning Probe Microscopy
Author
Tuma, Tomas ; Haeberle, Walter ; Rothuizen, Hugo ; Lygeros, John ; Pantazi, Angeliki ; Sebastian, Aradoaei
Author_Institution
IBM Res. - Zurich, Rueschlikon, Switzerland
Volume
19
Issue
3
fYear
2014
fDate
Jun-14
Firstpage
1035
Lastpage
1045
Abstract
This paper presents a dual-stage approach to nanopositioning in which the tradeoff between the scanner speed and range is addressed by combining a slow, large-range scanner with a short-range scanner optimized for high-speed, high-resolution positioning. We present the design, finite-element simulations, and experimental characterization of a fast custom-built short-range scanner. The short-range scanner is based on electromagnetic actuation to provide high linearity, has a clean, high-bandwidth dynamical response and is equipped with a low-noise magnetoresistance-based sensor. By using advanced noise-resilient feedback controllers, the dual-stage system allows large-range positioning with subnanometer closed-loop resolution over a wide bandwidth. Experimental results are presented in which the dual-stage scanner system is used for imaging in a custom-built atomic force microscope.
Keywords
closed loop systems; feedback; finite element analysis; nanopositioning; scanning probe microscopy; custom-built atomic force microscope; dual-stage nanopositioning; electromagnetic actuation; finite-element simulations; high-bandwidth dynamical response; high-resolution positioning; high-speed positioning; high-speed scanning probe microscopy; low-noise magnetoresistance-based sensor; noise-resilient feedback controllers; short-range scanner; subnanometer closed-loop resolution; Atomic force microscopy (AFM); control design; mechatronics; nanopositioning;
fLanguage
English
Journal_Title
Mechatronics, IEEE/ASME Transactions on
Publisher
ieee
ISSN
1083-4435
Type
jour
DOI
10.1109/TMECH.2013.2266481
Filename
6547719
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