Title :
Dual-Stage Nanopositioning for High-Speed Scanning Probe Microscopy
Author :
Tuma, Tomas ; Haeberle, Walter ; Rothuizen, Hugo ; Lygeros, John ; Pantazi, Angeliki ; Sebastian, Aradoaei
Author_Institution :
IBM Res. - Zurich, Rueschlikon, Switzerland
Abstract :
This paper presents a dual-stage approach to nanopositioning in which the tradeoff between the scanner speed and range is addressed by combining a slow, large-range scanner with a short-range scanner optimized for high-speed, high-resolution positioning. We present the design, finite-element simulations, and experimental characterization of a fast custom-built short-range scanner. The short-range scanner is based on electromagnetic actuation to provide high linearity, has a clean, high-bandwidth dynamical response and is equipped with a low-noise magnetoresistance-based sensor. By using advanced noise-resilient feedback controllers, the dual-stage system allows large-range positioning with subnanometer closed-loop resolution over a wide bandwidth. Experimental results are presented in which the dual-stage scanner system is used for imaging in a custom-built atomic force microscope.
Keywords :
closed loop systems; feedback; finite element analysis; nanopositioning; scanning probe microscopy; custom-built atomic force microscope; dual-stage nanopositioning; electromagnetic actuation; finite-element simulations; high-bandwidth dynamical response; high-resolution positioning; high-speed positioning; high-speed scanning probe microscopy; low-noise magnetoresistance-based sensor; noise-resilient feedback controllers; short-range scanner; subnanometer closed-loop resolution; Atomic force microscopy (AFM); control design; mechatronics; nanopositioning;
Journal_Title :
Mechatronics, IEEE/ASME Transactions on
DOI :
10.1109/TMECH.2013.2266481