DocumentCode :
1117043
Title :
An investigation of i-AlGaAs/n-GaAs doped-channel MIS-like FET´s (DMT´s)—Properties and performance potentialities
Author :
Hida, Hikaru ; Okamoto, Akihiko ; Toyoshima, Hideo ; Ohata, Keiichi
Author_Institution :
NEC Corporation, Nakagawa, Japan
Volume :
34
Issue :
7
fYear :
1987
fDate :
7/1/1987 12:00:00 AM
Firstpage :
1448
Lastpage :
1455
Abstract :
Doped-channel MIS-like FET´s (DMT´s) based upon an i-AlGaAs/n-GaAs structure have been investigated in detail for the purpose of clarifying their properties and performance potentialities. The DMT is unique in having two operation modes, a depletion-layer modulation mode and an electron accumulation mode, both of which are experimentally demonstrated through capacitance-voltage characteristics. Analytical and experimental results shows that the maximum drain current IDSmaxis more than 2.5 times that for a conventional n-AlGaAs/GaAs 2DEGFET. gmmaxand IDsmaxvalues obtained for 0.5- µm gate DMT´s are very high, 310 mS/mm (410 mS/mm) and 650 mA/mm (800 mA,/mm) at 300 K (77 K), respectively, fmaxis 48 GHz. fTis as large as 45 GHz, which is the best data ever reported in 0.5-µm gate FET´s. Moreover, the estimated electron saturation velocity is outstandingly large, 1.5 × 107cm/s (2 × 107cm/s) at 300 K (77 K), even for a thin GaAs channel layer with a 3 × 1018cm-3doping level, while Hall electron mobility is not reasonably so high, being typically 1850 cm2/V . s (1650 cm2/V . S). Preliminary power performances are also studied at 28.5 GHz. An 18-dBm (225-mW/mm) saturation output power, 6.4-dB linear gain, and 15-percent power added efficiency are achieved. A further performance improvement may be easily accomplished by gate length reduction, structure optimization, and so on. Consequently, it has been proved that DMT´s have great feasibility for high-speed and high-frequency high-power device applications.
Keywords :
Chemical technology; Doping; Electron mobility; FETs; Gallium arsenide; Leakage current; Molecular beam epitaxial growth; OFDM modulation; Power generation; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1987.23105
Filename :
1486816
Link To Document :
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